发明名称 |
SCANNING TYPE ELECTRON MICROSCOPE |
摘要 |
<p>An object of the invention is to reduce the beam drift in which the orbit of the charged particle beam is deflected by a potential gradient generated by a nonuniform sample surface potential on a charged-particle-beam irradiation area surface, the nonuniform sample surface potential being generated by electrification made when observing an insulating-substance sample using a charged particle beam.</p><p>Energy of the charged particle beam to be irradiated onto the sample is set so that generation efficiency of secondary electrons generated from the sample becomes equal to 1 or more. A flat-plate electrode (26) is located in such a manner as to be directly opposed to the sample. Here, the flat-plate electrode is an electrode to which a voltage can be applied independently, and which is equipped with a hole through which a primary charged particle beam can pass. Furthermore, a voltage can be applied independently to a sample stage (12) on which the sample is mounted. Here, the sample stage's surface directly opposed to the sample is formed into a planarized structure with no projections and depressions thereon. Also, diameter D of the hole provided in the flat-plate electrode (26) and distance L between the flat-plate electrode (26) and the sample are set such that a relation of D/L≦1. 5 is satisfied.</p> |
申请公布号 |
EP1777729(A1) |
申请公布日期 |
2007.04.25 |
申请号 |
EP20050770592 |
申请日期 |
2005.08.10 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
ARAI, NORIAKI;EZUMI, MAKOTO;OSE, YOICHI |
分类号 |
H01J37/02;H01J37/20;H01J37/28 |
主分类号 |
H01J37/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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