| 摘要 |
An integrated circuit (IC) has a functionality as required by the user of the circuit, and has first structures (S1) generated in several wiring planes (M1,M2,P) via exposure masks (MSKi) and serving to provided the given functionality. The second structures (S2) produced in the several wiring planes via the exposure masks (MSKi) do not serve the given functionality, but verify that the exposure masks being used belong to the same (common) set of masks. More specifically, the second structures (S2) can be electrically evaluated so that it can be established whether or not the exposure masks used during fabrication were assigned to the same set of masks. |
