发明名称 PATTERN WIRING, FORMING METHOD THEREOF, AND ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide pattern wiring with sufficient uniformity of film thickness distribution in a prescribed region, and to provide a forming method of pattern wiring, an electro-optical device having pattern wiring, and an electronic apparatus. SOLUTION: A divided region divided by a lower layer bank 10 is filled with functional liquid 50, and deposition is performed through a drying process. A connection region 42 of a main wiring region 40 and an electrode region 41 is formed to be narrower than width of the electrode region 41. A liquid level of functional liquid 50 in the electrode region 41 is made uniform by capillarity in the connection region 42. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007095729(A) 申请公布日期 2007.04.12
申请号 JP20050279255 申请日期 2005.09.27
申请人 SEIKO EPSON CORP 发明人 MORIYA KATSUYUKI;HIRAI TOSHIMITSU
分类号 H01L21/3205;G09F9/30;H01L21/288;H01L21/336;H01L29/786;H01L51/50;H05B33/10;H05K3/10 主分类号 H01L21/3205
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