发明名称 |
PATTERN WIRING, FORMING METHOD THEREOF, AND ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide pattern wiring with sufficient uniformity of film thickness distribution in a prescribed region, and to provide a forming method of pattern wiring, an electro-optical device having pattern wiring, and an electronic apparatus. SOLUTION: A divided region divided by a lower layer bank 10 is filled with functional liquid 50, and deposition is performed through a drying process. A connection region 42 of a main wiring region 40 and an electrode region 41 is formed to be narrower than width of the electrode region 41. A liquid level of functional liquid 50 in the electrode region 41 is made uniform by capillarity in the connection region 42. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2007095729(A) |
申请公布日期 |
2007.04.12 |
申请号 |
JP20050279255 |
申请日期 |
2005.09.27 |
申请人 |
SEIKO EPSON CORP |
发明人 |
MORIYA KATSUYUKI;HIRAI TOSHIMITSU |
分类号 |
H01L21/3205;G09F9/30;H01L21/288;H01L21/336;H01L29/786;H01L51/50;H05B33/10;H05K3/10 |
主分类号 |
H01L21/3205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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