SUBSTRATE TREATMENT APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus capable of accurately controlling a flow rate of a treatment liquid overflowing out of a treatment tank. SOLUTION: The substrate treatment apparatus 1 is constituted of a treatment tank 10 equipped with a contact member 40 on its periphery. The contact member 40 is of a wedge shape converging downward and the gap between the treatment tank 10 and the contact member 40 varies according to an upward or a downward movement of the contact member 40. If the contact member 40 is caused to descend to contact a treatment liquid 9, the treatment liquid 9 flows out into an outer tank 12 along the contact member 40. The flow rate of the treatment liquid 9 is accurately controlled by adjusting the gap between the treatment tank 10 and the contact member 40. COPYRIGHT: (C)2007,JPO&INPIT