| 发明名称 |
Verfahren zur Herstellung einer Schattenmaske |
| 摘要 |
The shadow mask (6) lies in intimate contact with the surface of a substrate and has at least one micromechanical-structured opening (116,118), e.g. provided via electrochemical etching, for allowing local processing of the substrate. An Independent claim for a method for manufacture of micromechanical openings in a shadow mask is also included. |
| 申请公布号 |
DE10035344(B4) |
申请公布日期 |
2007.04.05 |
| 申请号 |
DE2000135344 |
申请日期 |
2000.07.20 |
| 申请人 |
HAHN-SCHICKARD-GESELLSCHAFT FUER ANGEWANDTE FORSCHUNG E.V. |
发明人 |
SCHUMACHER, AXEL;NOMMENSEN, PETER;SCHEITHAUER, HERMANN;ALAVI, MANI |
| 分类号 |
B81B1/00;B81B3/00;B81C1/00;H01L21/60 |
主分类号 |
B81B1/00 |
| 代理机构 |
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