| 摘要 |
PROBLEM TO BE SOLVED: To improve in-plane uniformity of a film formed on the surface of a substrate in a CVD device. SOLUTION: The CVD device is provided with a boat 4 onto which a plurality of substrates 2 can be placed, an inner tube 6 provided so as to surround around the boat 4, an outer tube 8 covering the outside of the inner tube 6, a flange 10 for holding the inner tube 6 and the outer tube 8, gas introduction nozzles 12a, 12b provided in two places on the side wall of the flange 10 so as to introduce a gas into the inside of the inner tube 6 from the outside, a guide part 14, which is provided near spray ports of the gas introduction nozzles 12a, 12b inside the flange 10 in order to allow the gases respectively introduced from the gas introduction nozzles 12a, 12b to flow along the side wall inside the flange 10 in almost parallel to the bottom face of the flange 10 while mixing them, and a gas discharge part 16 for discharging a gas in the outer tube 8 to the outside of the outer tube 8. COPYRIGHT: (C)2007,JPO&INPIT
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