发明名称 PROCESSING METHOD FOR SUBSTRATE, AND THERMOSTATIC CHAMBER
摘要 PROBLEM TO BE SOLVED: To carry out processing such as inspection and machining with respect to a substrate with a temperature of the substrate accurately controlled. SOLUTION: In a main blow out opening 6 of blow out openings 6, 7 blowing out temperature-controlled air by an air conditioner 4 provided in a ceiling 1d into a room, a main curtain 14 is provided as an indoor duct guiding the air to an upper space of a table 12 for mounting the substrate 2, and a sub-curtain 15 is provided as a curtain like partition from the ceiling 1d to a height lower than a height of the table 12 to surround an outer side of a moving range of the table 12. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007078286(A) 申请公布日期 2007.03.29
申请号 JP20050268428 申请日期 2005.09.15
申请人 OMRON CORP 发明人 EGI MAMORU
分类号 F24F13/06 主分类号 F24F13/06
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