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发明名称
REPAIRING METHOD OF DEFECT IN SEMI-PERMEABLE PORTIONS OF HALF TONE MASK, AND REPAIRED HALF TONE MASK FOR FORMING PHOTORESIST PATTERN BY THE SAME
摘要
申请公布号
KR20070034346(A)
申请公布日期
2007.03.28
申请号
KR20050088939
申请日期
2005.09.23
申请人
发明人
分类号
G03F1/72;G03F1/32
主分类号
G03F1/72
代理机构
代理人
主权项
地址
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