Lithographic apparatus and device manufacturing method,申请号US20060355192-传众专利搜索

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法人/股东/高管

发明名称	Lithographic apparatus and device manufacturing method
摘要	A lithographic apparatus and device manufacturing method is provided in which exposure is carried out by projecting through a liquid having a pH of less than 7, the liquid being in contact with a substrate to be exposed. The liquid advantageously comprises an anti-reflective topcoat.
申请公布号	US2007046915(A1)	申请公布日期	2007.03.01
申请号	US20060355192	申请日期	2006.02.16
申请人	ASML NETHERLANDS B.V.	发明人	STREEFKERK BOB;DIERICHS MARCEL MATHIJS T.M.;GEHOEL-VAN ANSEM WENDY F.J.
分类号	G03B27/42;G03F7/20;H01L21/027	主分类号	G03B27/42
代理机构		代理人
主权项
地址

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