COMPOSITION FOR FORMING SILICA-BASED COATING, SILICA-BASED COATING, AND METHOD FOR FORMING SILICA-BASED COATING, AS WELL AS SEMICONDUCTOR DEVICE EQUIPPED WITH SILICA-BASED COATING

摘要

PROBLEM TO BE SOLVED: To provide a composition for forming a silica-based coating that is excellent in low dielectric property and can release a substituent group to be eliminated in a shorter heating time as compared to a conventional one, to provide a silica-based coating comprised of the composition and a method for forming the same, as well as to provide a semiconductor device provided with the silica-based coating. SOLUTION: The composition for forming a silica-based coating comprises a siloxane resin having a Si atom combined with both of a substituent group releasable at a predetermined temperature and a substituent group not releasable at a predetermined temperature, and a solvent that can dissolve the siloxane resin. COPYRIGHT: (C)2007,JPO&INPIT