发明名称 |
LITHOGRAPHIC DEVICE, IRRADIATION SYSTEM, IRRADIATION CONTROLLER, AND CONTROL METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To lower a standard deviation of a pulsed output of an irradiation laser and enable provision of uniform pulsed irradiation onto each pulse window on a substrate. <P>SOLUTION: A negative-feedback control loop is implemented in such a configuration that a double integrator unit 309 at least twice integrates an irradiation dose signal representative of a measured pulsed-irradiation dose to generate an integrator output signal 313, which adjusts a driving input 315 to a source of irradiation laser pulses. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007027758(A) |
申请公布日期 |
2007.02.01 |
申请号 |
JP20060195334 |
申请日期 |
2006.07.18 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
KRUIJSWIJK STEFAN G;HEINTZE JOHANNES;VAN DER VEEN PAUL |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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