发明名称 LITHOGRAPHIC DEVICE, IRRADIATION SYSTEM, IRRADIATION CONTROLLER, AND CONTROL METHOD
摘要 <P>PROBLEM TO BE SOLVED: To lower a standard deviation of a pulsed output of an irradiation laser and enable provision of uniform pulsed irradiation onto each pulse window on a substrate. <P>SOLUTION: A negative-feedback control loop is implemented in such a configuration that a double integrator unit 309 at least twice integrates an irradiation dose signal representative of a measured pulsed-irradiation dose to generate an integrator output signal 313, which adjusts a driving input 315 to a source of irradiation laser pulses. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007027758(A) 申请公布日期 2007.02.01
申请号 JP20060195334 申请日期 2006.07.18
申请人 ASML NETHERLANDS BV 发明人 KRUIJSWIJK STEFAN G;HEINTZE JOHANNES;VAN DER VEEN PAUL
分类号 H01L21/027 主分类号 H01L21/027
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