发明名称 Semiconductor device and method of manufacturing the same
摘要 A method of manufacturing a semiconductor device, including: providing a semiconductor substrate which has a plurality of electrodes and in which a depression is formed on a side on which the electrodes are formed; forming a resin protrusion on the semiconductor substrate so that part of the resin protrusion is positioned in the depression; and forming an interconnect on the resin protrusion, the interconnect being electrically connected to at least one of the electrodes.
申请公布号 US2007018306(A1) 申请公布日期 2007.01.25
申请号 US20060480376 申请日期 2006.07.05
申请人 SEIKO EPSON CORPORATION 发明人 OHARA HIROSHI
分类号 H01L23/48;H01L21/44 主分类号 H01L23/48
代理机构 代理人
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