| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of forming a less defective resist film by reliably and efficiently removing microcontamination causing micro defects in a resist liquid, and preventing fine bubbles from being produced. <P>SOLUTION: The method of forming a resist film by coating a board with a resist liquid after filtering the resist liquid at a filtering pressure of 9,500 Pa or less, using a high polymer material-made filter having a hole diameter of 0.02 μm. This reliably and efficiently removes microcontamination in the resist liquid causing micro defects from which no problem arises in the prior art, prevents fine bubbles from being produced to lessen the defect of the resist film down to a required quantity of defects, and improves the yield of a resist film-coated product such as photo mask blank formed with the resist film and a work under process such as finely processed photo masks using the resist film. Thus, the resist film is formed efficiently by keeping the productivity of the resist film forming at a maximum with meeting the requirements of the resist film for lessening the defect. <P>COPYRIGHT: (C)2007,JPO&INPIT |
