发明名称 PATTERN FORMING METHOD, SUBSTRATE WITH COLOR FILTER, AND DISPLAY ELEMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a pattern forming method by which, when an ITO film is formed on the pattern, a ITO film with low resistance can be formed while keeping small changes in the resistance within the plane, and to provide a substrate with a color filter having pixels formed by the above pattern forming method, and to provide a display element having the substrate with a color filter. <P>SOLUTION: The pattern forming method for obtaining a pattern of a color filter through at least a resin layer forming step of forming a photosensitive resin layer comprising a photopolymerizable photosensitive resin composition on a substrate, a pattern exposure step of exposing the layer using a laser, a developing step of developing the photosensitive resin layer after pattern exposure, and a post-baking step of heat treating the photosensitive resin layer after development. The color filter of the substrate with a color filter is formed by the above forming method. The display element is equipped with the substrate with a color filter. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007011231(A) 申请公布日期 2007.01.18
申请号 JP20050195469 申请日期 2005.07.04
申请人 FUJIFILM HOLDINGS CORP 发明人 SATO MORIMASA
分类号 G02B5/20;G02F1/1333;G02F1/1343;G03F7/40 主分类号 G02B5/20
代理机构 代理人
主权项
地址