| 摘要 |
<p>Provided is a hardmask composition which exhibits excellent optical property, mechanical property, and etch selectivity, has a minimum amount or no acid contaminants, and can be applied by spin-on application technique. The hardmask composition comprises (a) an aromatic ring-containing polymer represented by the formula(2); (b) a crosslinking ingredient; and (c) an acid catalyst. In the formula(2), n is 1<=n<=190, R5, R6 is hydrogen, C1-C10 alkyl group, C6-C10 aryl group or allyl group. The composition comprises (a) 1-20 wt% of the aromatic ring-containing polymer, (b) 0.1-5 wt% of crosslinking ingredient, and (c) 0.001-0.05 wt% of acid catalyst, and the rest of organic solvent. The aromatic ring-containing polymer has a weight average molecular weight of 1,000-30,000. The composition further comprises solvent or surfactant.</p> |
