LEVENSON TYPE PHASE SHIFT MASK AND PRODUCTION METHOD THEREFOR

摘要

A Levenson type phase shift mask which has light shielding portions and openings formed on a transparent substrate, and which is repeatedly provided with shifter openings formed by partially digging the transparent substrate portions of the openings or partially laying transparent films on the transparent substrate portions of the openings and with non-shifter openings to reverse the phase of a transmitted light by the shifter openings, wherein light shielding patterns each held by adjacent openings of the same kind from the opposite sides are provided, and a bias correction is made for widening the light shielding pattern a specified amount toward the opposite sides with respect to specified design line width defined by mask designing. ® KIPO & WIPO 2007