发明名称 Lithographic apparatus and device manufacturing method
摘要 In one embodiment, a pulse-to-pulse dose reproducibility of a radiation system for use in maskless lithography is improved by providing a plurality of lasers and combining the radiation beams produced by each to form a single projection beam of radiation.
申请公布号 US7161661(B2) 申请公布日期 2007.01.09
申请号 US20040895999 申请日期 2004.07.22
申请人 ASML NETHERLANDS B.V. 发明人 BLEEKER ARNO JAN
分类号 G03B27/72;G03B27/42;G03B27/54;G03F7/20;H01L21/027 主分类号 G03B27/72
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