发明名称 Method for controlling charged particle beam, and charged particle beam apparatus
摘要 According to the invention, to achieve the above objective, there is provided a charged particle beam apparatus that creates a first image by irradiating a charged particle beam on a sample to scan a first pattern of the sample, controls on the basis of the first image the focus of the charged particle beam and the brightness and/or contrast of the image, and irradiates the charged particle beam to correctly scan a second pattern different from the first pattern by using the control conditions used to control the focus of the charged particle beam and the brightness and/or contrast of the image.
申请公布号 US7154090(B2) 申请公布日期 2006.12.26
申请号 US20050127248 申请日期 2005.05.12
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 KAWADA HIROKI;NAKAGAKI RYO
分类号 G01N23/00;H01L21/66;A61N5/00;G01J1/00;G01N23/225;G21G5/00;G21K7/00;H01J37/21;H01J37/22;H01J37/28 主分类号 G01N23/00
代理机构 代理人
主权项
地址