发明名称 |
Method for controlling charged particle beam, and charged particle beam apparatus |
摘要 |
According to the invention, to achieve the above objective, there is provided a charged particle beam apparatus that creates a first image by irradiating a charged particle beam on a sample to scan a first pattern of the sample, controls on the basis of the first image the focus of the charged particle beam and the brightness and/or contrast of the image, and irradiates the charged particle beam to correctly scan a second pattern different from the first pattern by using the control conditions used to control the focus of the charged particle beam and the brightness and/or contrast of the image.
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申请公布号 |
US7154090(B2) |
申请公布日期 |
2006.12.26 |
申请号 |
US20050127248 |
申请日期 |
2005.05.12 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
KAWADA HIROKI;NAKAGAKI RYO |
分类号 |
G01N23/00;H01L21/66;A61N5/00;G01J1/00;G01N23/225;G21G5/00;G21K7/00;H01J37/21;H01J37/22;H01J37/28 |
主分类号 |
G01N23/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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