| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus generating a plasma having high homogeneity and stability. <P>SOLUTION: This apparatus generating a plasma uses a μ wave for rotating the μ wave in terms of time, by using a plurality (from 2 to 4) of waveguides and by arranging the waveguides. Two waveguides are declined to give phase difference in an electric field, and a circularly polarized wave is introduced into a treatment chamber. At this time, an arranging method of waveguides and a means thereof, a merging chamber in which μ waves are merged, and a controlling means of a reflected wave using a reflection controlling chamber are provided. Thus, in a method for generating a plasma using a μ wave by providing a means for rotating a μ wave in a wide parameter region, a plasma treatment apparatus can be provided which can obtain a plasma having a high density and a high homogeneity in a wide process parameter region. As a result, a homogeneous processing of a wafer can be obtained having a large aperture with a high processing rate. <P>COPYRIGHT: (C)2007,JPO&INPIT |
