发明名称 Method of qualifying a diffraction grating and method of manufacturing an optical element
摘要 A method of qualifying a diffraction grating comprises performing plural measurements by illuminating a region of the grating with a beam of measuring light and detecting an intensity of measuring light diffracted by the grating into a 0th diffraction order. A wavelength of the measuring light or a polarization of the measuring light or an angle of incidence of the measuring light onto the diffraction grating is varied between subsequent measurements. A shape parameter of diffracting elements forming the grating comprises a pitch, height or width of structural features of the diffracting elements. The shape parameter is advantageously used in analyzing interferometric measurements performed on optical surfaces during manufacture of optical elements of a high accuracy.
申请公布号 US2006274325(A1) 申请公布日期 2006.12.07
申请号 US20060439719 申请日期 2006.05.23
申请人 CARL ZEISS SMT AG 发明人 HETZLER JOCHEN;ANDIEL ULRICH;BRANDENBURG HARTMUT
分类号 G01B9/02 主分类号 G01B9/02
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