METHOD FOR IN-SITU POLYCRYSTALLINE THIN FILM GROWTH

摘要

A method for in-situ polycrystalline thin film growth is provided to manufacture a large-sized element without a large-sized post-heating process apparatus. A method for in-situ polycrystalline thin film growth includes the steps of: ventilating vacuum inside a process chamber; cleaning a vacuum chamber and a catalyst in the vacuum-ventilated process chamber; inserting a substrate into the cleaned process chamber(S20); spaying a process gas inside the process chamber to which the substrate is inserted; and growing the process gas as the polycrystalline thin film at a surface of the substrate by using a reaction of the catalyst in the process chamber to which the process gas is sprayed.