| 摘要 |
<p>Hard-mask composition having minimum residual acid content and anti-reflective property is provided to give extremely excellent optical and mechanical properties and etching selectivity by comprising aromatic-ring containing polymer with strong absorbance at short wavelength. The hard-mask composition comprises: (a) 1 to 20wt.% of at least one of aromatic ring containing polymer represented by any one of formulae(1) to (3) wherein for the formula(1), n ranges from 1 to 190, R1 and R2 are independently hydroxyl group(-OH), alkyl or aryl group having carbon atoms ranging from 1 to 10, allyl group or halogen atoms, and R3 and R4 are independently hydrogen or include active fraction reacting with cross-linkable component or chromophore fraction; (b) 0.1 to 5wt.% of the cross-linkable component; (c) 0.001 to 0.05wt.% of acid catalyst; and the balance of organic solvent. The aromatic ring containing polymer has weight average molecular weight ranging from 1,000 to 30,000.</p> |
