发明名称 |
Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method |
摘要 |
A multi-layer mirror includes on top of the multi-layer mirror a spectral purity enhancement layer, for example for application in an EUV lithographic apparatus. This spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may optionally be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. Hence, multi-layer mirrors with the following configurations are possible: multi-layer mirror/first spectral purity enhancement layer; multi-layer mirror/intermediate layer/first spectral purity enhancement layer; and multi-layer mirror/second spectral purity enhancement layer/intermediate layer/first spectral purity enhancement layer. The spectral purity of normal incidence radiation may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.
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申请公布号 |
EP1717609(A1) |
申请公布日期 |
2006.11.02 |
申请号 |
EP20060113136 |
申请日期 |
2006.04.26 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN HERPEN, MAARTEN MARINUS JOHANNES WILHELMUS;BAKKER, LEVINUS PIETER;BANINE, VADIM YEVGENYEVICH;KLUNDER, DERK JAN WILFRED |
分类号 |
G02B5/08;B82Y10/00;G02B1/10;G02B5/28;G03F7/20;G21K1/06 |
主分类号 |
G02B5/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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