| 摘要 |
<p>The device has a carrying unit (20), over which a substrate channel (60) runs. A guide plate (40) is connected with the unit (20) and leads away from an end (41) of the channel. A gas flow (30) is discharged from the unit (20) and has floating and intake areas (31, 32). The gas flow flows between the unit (20) and the channel in the area (31), and ensures continuous process of the guide plate and flows away from the channel in the area (32). An independent claim is also included for a method for treating e.g. drying, a substrate channel.</p> |
