| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing a polishing pad formed out of a polyurethane resin foam having extremely uniform fine bubbles, and to provide the polishing pad obtained by the method. <P>SOLUTION: This method for producing the polishing pad includes a process (1) for together mixing a first component containing an isocyanate-terminated prepolymer and a second component containing a chain extender and curing the mixed components, so as to prepare the polyurethane resin foam, wherein the process (1) comprises a process for adding a silicon-based surfactant to the first component in such an amount that the surfactant is contained in the polyurethane resin foam in an amount of 0.05-10 wt.%, then stirring the first component with a nonreactive gas and dispersing the gas therein, so as to prepare a bubble dispersion in which the nonreactive gas is dispersed as the fine bubbles, further mixing the second component into the bubble dispersion and curing them, so as to prepare the urethane resin foam, and the chain extender comprises an aromatic polyamine having a melting point of ≤70°C. <P>COPYRIGHT: (C)2007,JPO&INPIT |
