MULTILAYER STRUCTURE

摘要

Disclosed is a multilayer structure having at least two layers, namely a layer A which is composed of a polyamide resin composition (a) containing 30-90 mass% of a polyamide resin (X), which is composed of a dicarboxylic acid unit containing 50-100 mol% of terephthalic acid unit and/or a naphthalene dicarboxylic acid unit and a diamine unit containing 60-100 mol% of an aliphatic diamine unit having 9-13 carbon atoms, and 70-10 mass% of an impact resistance modifier; and a layer B which is composed of a polyamide resin composition (b) containing 50-95 mass% of a polyamide resin (X'), which is composed of a dicarboxylic acid unit containing 50-100 mol% of terephthalic acid unit and/or a naphthalene dicarboxylic acid unit and a diamine unit containing 60-100 mol% of an aliphatic diamine unit having 9-13 carbon atoms, and 50-5 mass% of an impact resistance modifier. In this connection, when the ratio of the impact resistance modifier contained in the layer A is represented by Y mass% and the ratio of the impact resistance modifier contained in the layer B is represented by Y' mass%, the following relation is satisfied: Y = Y' + 5.