| 摘要 |
PROBLEM TO BE SOLVED: To provide a reduced-pressure dryer in which the components of thin film, e.g. photoresist, can be prevented from adhering to an exhaust pump. SOLUTION: The reduced-pressure dryer comprises a chamber 10 covering the circumference of a substrate W, an exhaust pump 50, a first opening/closing valve 41, a second opening/closing valve 42, and a third opening/closing valve 43. After photoresist formed on the major surface of the substrate W is vacuum dried by opening the first opening/closing valve 41 and evacuating the chamber 10, the first opening/closing valve 41 is closed and evacuation of the chamber 10 is stopped. Subsequently, inert gas is supplied to the exhaust pump 50 by opening the second opening/closing valve 42, and inert gas is supplied into the chamber 10 by opening the third opening/closing valve 43. COPYRIGHT: (C)2006,JPO&NCIPI
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