发明名称 |
SIGNAL FETCH STRUCTURE OF SEMICONDUCTOR MICRO ELECTRO-MECHANICAL DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To appropriately generate an electrical signal to certainly fetch and to reduce the manufacturing cost, by using a conductive low-melting-point material melting when an insulating substrate and the semiconductor plate are anode-joined to a part of a fetch route of the electrical signal to the outside, in a signal fetch structure of a semiconductor micro electro-mechanical device. SOLUTION: The semiconductor micro electro-mechanical device is formed by anode-joining the insulating substrate 2 to the upper surface of the semiconductor plate 1. An electrical signal from a fixed electrode 6 formed in the insulating substrate 2 is fetched from a conductive drawer film 4a disposed in a through hole 2a via a conductive pad 7a connected to the fixed electrode 6 and a low-melting-point material film 5 connected to the conductive pad 7a. The semiconductor plate 1 is anode-joined to the insulating substrate 2 in a state where the low-melting-point material film 5 is formed in the insulating substrate 2, and the low-melting-point material film 5 is molten by the heat of the anode-joining to be certainly connected to the conductive pad 7a, so that the conductive reliability is improved. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2006250778(A) |
申请公布日期 |
2006.09.21 |
申请号 |
JP20050068861 |
申请日期 |
2005.03.11 |
申请人 |
MATSUSHITA ELECTRIC WORKS LTD |
发明人 |
FURUKUBO HIDEKAZU;AKAI SUMIO;SAKAI KOJI;ISHIGAMI ATSUSHI;MESHII RYOSUKE;FUKUDA SUMIHISA |
分类号 |
G01P15/08;G01P15/125;H01L29/84 |
主分类号 |
G01P15/08 |
代理机构 |
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