| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist which shows little deterioration in the sensitivity when applied to liquid immersion exposure compared to dry exposure and causes extremely little elution of an acid into an immersion liquid, and which is suitable for liquid immersion exposure. <P>SOLUTION: The positive resist composition for liquid immersion exposure contains (A) a resin the solubility of which with an alkali developing solution is increased by an effect of an acid, and (B) a compound which generates an acid by irradiation with active rays or radiation. When the composition is applied to form a coating film on a substrate, the composition exhibits a static contact angle of ≥72° to pure water and a static contact angle of ≤70° to an alkali developing solution. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
