发明名称 |
Composition and method for removing copper-compatible resist |
摘要 |
A composition for removing a copper-compatible resist includes: about 0.1% to about 10% by weight of an alkylbenzenesulfonic compound; about 10% to about 99% by weight of a glycolether compound; and about 0.5% to about 5% by weight of a corrosion inhibitor.
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申请公布号 |
US7091165(B2) |
申请公布日期 |
2006.08.15 |
申请号 |
US20030694951 |
申请日期 |
2003.10.29 |
申请人 |
DONGJIN SEMICHEM CO., LTD. |
发明人 |
JO GYOO-CHUL;CHAE GEE-SUNG;KWON OH-NAM;LEE KYOUNG-MOOK;HWANG YONG-SUP;KIM SEONG-BAE;JANG SUK-CHANG |
分类号 |
C11D1/00;G03F7/42;C11D1/22;C11D3/20;C11D7/26;C11D7/34;C11D11/00;H01L21/027;H01L21/3205;H01L21/3213;H01L23/52 |
主分类号 |
C11D1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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