发明名称 |
Local irradiance regulation method for optical system in projection exposure arrangement, involves forming optical path between optical units and determining temperature distribution of irradiated upper surface of object |
摘要 |
<p>The method involves providing optical units between which an optical light path (2) is formed. A measuring object, for partially absorbing the radiation in the light path, is positioned in the partial region of the light path that is selected for the position assigned regulation of irradiance. The temperature distribution of an irradiated upper surface of the measuring object is determined by a temperature detector (50) e.g. thermal camera. An independent claim is also included for a method for production of microelectronic components.</p> |
申请公布号 |
DE102005004460(A1) |
申请公布日期 |
2006.08.10 |
申请号 |
DE20051004460 |
申请日期 |
2005.02.01 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
MELZER, FRANK;SCHOLZ, AXEL |
分类号 |
G01J1/42;G03F7/20 |
主分类号 |
G01J1/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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