发明名称 |
Improvements in or relating to semiconductor devices |
摘要 |
A layer of a nitride of silicon is provided over at least that part of the surface of a semi-conductor body where a P-N junction emerges. The layer is provided by deposition from a gaseous atmosphere comprising a mixture of nitrogen and hydrogen bubbled through silicon tetrachloride, or a mixture of a silicon hydride with a nitrogen hydride or a halogen compound of ammonia, or disilylamine. Hydrogen or nert gas may be used as a carrier, and deposition may be effected by heating the semi-conductor body or by means of an R.F.-initiated electric discharge. |
申请公布号 |
GB1006803(A) |
申请公布日期 |
1965.10.06 |
申请号 |
GB19630018567 |
申请日期 |
1963.05.10 |
申请人 |
STANDARD TELEPHONES AND CABLES LIMITED |
发明人 |
STIRLING HENLEY FRANK;DRAKE CYRIL FRANCIS |
分类号 |
C23C16/34;C23C16/50;H01L21/00;H01L21/316;H01L21/318;H01L23/29;H01L29/00;H01L29/06 |
主分类号 |
C23C16/34 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|