发明名称 MANUFACTURING METHOD AND MANUFACTURING DEVICE OF SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To improve the quality of an insulative coated molding and productivity in an insulative coating formation process in a process that beforehand forms an insulative coating on a defective element electrode so as not to allow other elements to be affected by the defective element such that a power supply line and an eathing line are short-circuited. SOLUTION: A U.V. resin 9 can be centrally dropped in the specific region of an electrode 5 by slating a nozzle spraying the resin 9 at 45°when the insulative coating is formed on the electrode 5 of the semiconductor device, and the dropping direction of the resin 9 can be determined in a direction of the same condition even if the electrode 5 is located at any position on the semiconductor device by providing a rolling mechanism to the nozzle 7, thus, this allows the dropping condition to be easily determined together with the nozzle 7, thereby enabling the system to improve the quality of the insulative coated molding. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006191155(A) 申请公布日期 2006.07.20
申请号 JP20060098867 申请日期 2006.03.31
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 YAMADA KENJI;FURUMOTO KENJI;NAKAYAMA TOMOYUKI
分类号 H01L21/312;H01L21/66 主分类号 H01L21/312
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