发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
Use of a refraction grating to divide a beam of radiation into a plurality of sub-beams that are each directed onto an array of individually controllable elements, modulated thereby and projected onto a substrate as an array of spots.
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申请公布号 |
US7079225(B2) |
申请公布日期 |
2006.07.18 |
申请号 |
US20040939947 |
申请日期 |
2004.09.14 |
申请人 |
ASML NETHERLANDS B.V |
发明人 |
BASELMANS JOHANNES JACOBUS MATHEUS;BRUINSMA ANASTASIUS JACOBUS ANICETUS;DE JAGER PIETER WILLEM HERMAN;VINK HENRI JOHANNES PETRUS |
分类号 |
G03B27/54;G03B27/42 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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