发明名称 Lithographic apparatus and device manufacturing method
摘要 Use of a refraction grating to divide a beam of radiation into a plurality of sub-beams that are each directed onto an array of individually controllable elements, modulated thereby and projected onto a substrate as an array of spots.
申请公布号 US7079225(B2) 申请公布日期 2006.07.18
申请号 US20040939947 申请日期 2004.09.14
申请人 ASML NETHERLANDS B.V 发明人 BASELMANS JOHANNES JACOBUS MATHEUS;BRUINSMA ANASTASIUS JACOBUS ANICETUS;DE JAGER PIETER WILLEM HERMAN;VINK HENRI JOHANNES PETRUS
分类号 G03B27/54;G03B27/42 主分类号 G03B27/54
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