发明名称 METHODS FOR CLEANING A SET OF STRUCTURES COMPRISING YTTRIUM OXIDE IN A PLASMA PROCESSING SYSTEM
摘要 A method of removing a set of particles from a set of structures including yttrium oxide is disclosed. The method includes exposing the set of structures to a first solution including an oxidizer for a first period. The method also includes removing the set of structures from the first solution, and exposing the set of structures to a second solution including a keytone reagent for a second period. The method further includes removing the set of structures from the second solution, and mechanically rubbing the set of structures with a third solution including a first set of acids for a third period.
申请公布号 KR20060080210(A) 申请公布日期 2006.07.07
申请号 KR20067005486 申请日期 2006.03.17
申请人 发明人
分类号 B08B3/08;B08B3/00;B08B3/12;B08B6/00;B08B7/00;B08B9/00;B44C1/22;C23G1/00;C23G1/02;H01L 主分类号 B08B3/08
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