发明名称 |
Target of high-purity nickel or nickel alloy and its producing method |
摘要 |
Provided is high purity nickel or nickel alloy target for Magnetron sputtering having superior sputtering film uniformity and in which the magnetic permeability of the target is 100 or more, and this high purity nickel or a nickel alloy target for magnetron sputtering capable of achieving a favorable film uniformity (evenness of film thickness) and superior plasma ignition (firing) even during the manufacturing process employing a 300 mm wafer. The present invention also provides the manufacturing method of such high purity nickel or nickel alloy target.
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申请公布号 |
US2006137782(A1) |
申请公布日期 |
2006.06.29 |
申请号 |
US20060332045 |
申请日期 |
2006.01.13 |
申请人 |
NIKKO MATERIALS CO., LTD. |
发明人 |
YAMAKOSHI YASUHIRO;MIYASHITA HIROHITO |
分类号 |
C22F1/10;C22C19/03;C22F1/00;C23C14/34;G11B5/851;H01F41/18 |
主分类号 |
C22F1/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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