| 摘要 |
FIELD: plasma equipment. ^ SUBSTANCE: method of getting stationary combined discharge of low-pressure low-temperature plasma at end part of treated electro-conducting object provided with protruding parts or sharp edges is based upon application of positive potential. Positive potential forms electro-static field around the object. Microwave electromagnetic field is applied onto electrostatic field at the level of microwave power being lower than required one for exciting and keeping electrode-free microwave frequency discharge but being sufficient for exciting and keeping stationary combined discharge of low-pressure low-temperature plasma. Device for realization of the method has cylindrical resonator, microwave frequency power generator, excitation system, and unit for applying potential to treated electro-conducting object, vacuum system and gas leak-in system. Cylindrical resonator is excited by waveguide-slot aerial which is folded to form a ring. Positive potential is applied to object to be treated by means of holder. Holder is disposed in part of cylindrical resonator to be treated under vacuum. ^ EFFECT: improved wear resistance; improved adhesion of coatings applied before. ^ 4 cl, 4 dwg |
