发明名称 Manufacturing method of substrate
摘要 Provided is a manufacturing method of a substrate capable of forming a pattern having a relatively narrow width and thick film based on a droplet discharging method. The manufacturing method of a substrate of the present invention is a manufacturing method of a substrate having a patterned functional film, including the steps of: forming a groove pattern on the substrate with laser irradiation; disposing a liquid material along the groove pattern; and heating the liquid material so as to form the functional film. Further, the groove pattern and a liquid repellent film may be combined. By using a liquid material, a highly dense and minute functional film (a wiring pattern for example) can be formed on the substrate.
申请公布号 US2006113284(A1) 申请公布日期 2006.06.01
申请号 US20050239566 申请日期 2005.09.29
申请人 UMETSU KAZUSHIGE 发明人 UMETSU KAZUSHIGE
分类号 C23F1/00;B23P15/00;H01L21/311 主分类号 C23F1/00
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