| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a device for correcting fine pattern, having a short distance between an observation position and an application position. <P>SOLUTION: A correction fluid application mechanism 4 included in the device for correcting fine pattern, is provided with an application needle 11 applying the correction fluid onto a defect; an application pallet 14 holding a correction fluid tank 15; a straightly moving actuator 12 moving the needle 11 on an XY plane and in the Z-direction to position the needle 11 on either of an application waiting position in a visual field of an observation optical system 2 and a preparation position in the vicinity of the application pallet 14. Thus, the distance for moving an X-stage 7 and a Y-stage 8 from a state of specifying the application position by the observation optical system 2 to the application position, can be greatly shortened compared to the conventional device. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
