发明名称 System and method for reticle protection and transport
摘要 A substrate protection and transport system and method for transitioning a substrate from atmospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes that support a substrate. The cassette can include a base portion and top portion, and can include a seal. Each cassette has at least one vent and at least one filter. The system further includes a box having a base and lid. The box holds one or more cassette-substrate arrangements. A storage rack having shelves for holding the box-cassette-substrate arrangement is also provided. Further, an entry-exit module having a loadlock is provided for transitioning the cassette-substrate arrangement from atmospheric pressure to vacuum. The entry-exit module can include a shuttle and/or elevator for transporting the cassette-substrate arrangement. During transitioning, the filter(s) and vent(s) restrict particles within the loadlock from entering the cassette-substrate arrangement and reaching a surface of the substrate.
申请公布号 US2006078407(A1) 申请公布日期 2006.04.13
申请号 US20050282474 申请日期 2005.11.21
申请人 ASML HOLDING N.V. 发明人 DEL PUERTO SANTIAGO E.;DEMARCO MICHAEL A.;FRIEDMAN GLENN M.;IVALDI JORGE S.;MCCLAY JAMES A.
分类号 G03F1/14;H01L21/677;G03F7/20;H01L21/027;H01L21/673 主分类号 G03F1/14
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