| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cover film for photosensitive layer which can be applied for directly plotting by a laser exposure of 405 nm, prevents deterioration of the sensitivity of a photosensitive layer due to oxygen and has satisfactory handleability, adhesiveness and strippability, and to provide a pattern exposure method that uses the cover film for photosensitive layer. <P>SOLUTION: In the method for forming a pattern by performing exposure and development with respect to the photosensitive layer, the cover film for photosensitive layer is disposed and used on the photosensitive layer and has a total light transmittance of 70% or higher for a laser beam of wavelength 405 nm. In the pattern exposure method, exposure is performed to the photosensitive layer, on which the cover film for photosensitive layer is disposed by using a laser beam of wavelength 395 to 415 nm. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
