发明名称 |
METHOD AND SYSTEM FOR CONTAMINATION DETECTION AND MONITORING IN A LITHOGRAPHIC EXPOSURE TOOL AND OPERATING METHOD FOR THE SAME UNDER CONTROLLED ATMOSPHERIC CONDITIONS |
摘要 |
By using highly efficient detection techniques, such as chromatography and absorption spectroscopy, one or more contaminants may be identified and the concentration thereof may quantitatively be determined. In this way, the adverse effect on critical components of exposure tools, such as reticles and lenses in the form of, for instance, deposited inorganic salts, may significantly be reduced and the process performance may be enhanced. |
申请公布号 |
WO2006039161(A2) |
申请公布日期 |
2006.04.13 |
申请号 |
WO2005US33818 |
申请日期 |
2005.09.21 |
申请人 |
ADVANCED MICRO DEVICES, INC.;KNAPPE, UWE;OKOROANYANWU, UZODINMA |
发明人 |
KNAPPE, UWE;OKOROANYANWU, UZODINMA |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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