发明名称 |
Fluoropolymer |
摘要 |
To provide a fluoropolymer suitable for use as a base polymer for resist materials for excimer lasers having a wavelength of 250 nm or shorter. A fluoropolymer having a monomer unit formed by cyclopolymerization of a fluorinated diene compound represented by the following formula (3), <?in-line-formulae description="In-line Formulae" end="lead"?>CF<SUB>2</SUB>-CFCF<SUB>2</SUB>-C(CF<SUB>3</SUB>)(R<SUP>5</SUP>)-CH<SUB>2</SUB>CH-CH<SUB>2</SUB> (3)<?in-line-formulae description="In-line Formulae" end="tail"?> wherein R<SUP>5 </SUP>is either a hydroxyl group blocked by -CHR<SUP>7</SUP>-O-R<SUP>8 </SUP>or an organic group having the hydroxyl group, and R<SUP>8 </SUP>is a cyclic saturated hydrocarbon such as a cycloalkyl group which may have a substituent, or an organic group having the cyclic saturated hydrocarbon.
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申请公布号 |
US7026416(B2) |
申请公布日期 |
2006.04.11 |
申请号 |
US20050124133 |
申请日期 |
2005.05.09 |
申请人 |
ASAHI GLASS COMPANY, LIMITED |
发明人 |
KAWAGUCHI YASUHIDE;OKADA SHINJI;TAKEBE YOKO;YOKOKOJI OSAMU;KANEKO ISAMU |
分类号 |
C08F136/16;C08F36/16;C08F36/20;C08F214/18;C08F236/16;G03F7/039 |
主分类号 |
C08F136/16 |
代理机构 |
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主权项 |
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地址 |
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