| 摘要 |
PROBLEM TO BE SOLVED: To prevent flow out of thin film material liquid over a bank when thin films having different characteristic properties are formed on the same substrate by patterning, surely accurately, relatively simply form in high yield the thin film layer having stable characteristics such as flat surface, uniform thickness, and no color unevenness, and make precise fine patterning possible. SOLUTION: The manufacturing method of a display device contains a process in which a bank containing at least an organic material is selectively formed on a bank forming surface having a part of an inorganic material, and the thin film layer having the prescribed thickness is formed in a region surrounded by the bank by filling the thin film material liquid, and furthermore contains a surface treatment process conducting plasma treatment to the bank and the bank forming surface, a material discharge process discharging the thin film material liquid to a region surrounded with the bank, and a drying process removing a solvent component of the thin film material liquid, and the material liquid discharge process and the solvent component removing process are repeated so that the thin film layer becomes the prescribed thickness. COPYRIGHT: (C)2006,JPO&NCIPI |
