发明名称 A METHOD OF FORMING AN INTEGRATED CIRCUIT SUBSTRATE
摘要 <p>A method of forming an integrated circuit substrate that may be adapted to be attached to one or more electronic components. The method includes applying a resist to a back side of a substrate which includes patterned conductive layers on a front side and a back side of the substrate. The method further includes removing part of the patterned conductive layer from the front side of the substrate to form pads and interconnects on the front side of the substrate and applying another resist to the front side of the substrate. The method also includes forming a pattern in each resist that exposes the pads on the front and back sides of the substrate and applying electrolytic nickel to the pads on the substrate.</p>
申请公布号 EP1639873(A2) 申请公布日期 2006.03.29
申请号 EP20040755653 申请日期 2004.06.18
申请人 INTEL CORPORATION 发明人 GURUMURTHY, CHARAN;AZIMI, HAMID;LIN, ARTHUR
分类号 H01L21/48;H05K3/10;H05K3/24;H05K3/46;(IPC1-7):H05K3/24 主分类号 H01L21/48
代理机构 代理人
主权项
地址