POSITIVE RESIST COMPOSITION FOR LIQUID IMMERSION EXPOSURE AND METHOD FOR FORMING PATTERN BY USING SAME

摘要

PROBLEM TO BE SOLVED: To provide a resist suitable for liquid immersion exposure that is less in the deterioration in sensitivity as compared with dry exposure when applied to liquid immersion exposure, and extremely low in elution of an acid to an immersion liquid.

SOLUTION: The positive resist composition for liquid immersion exposure comprises: (A) a resin containing contains at least one kind of repeating unit having a fluorine atom and increasing a solubility of the resin in an alkali developing liquid by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation.

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