METHOD OF MANUFACTURING METAL LAYER OF SEMICONDUCTOR DEVICE,申请号KR20040101606-传众专利搜索

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发明名称	METHOD OF MANUFACTURING METAL LAYER OF SEMICONDUCTOR DEVICE
摘要
申请公布号	KR100557647(B1)	申请公布日期	2006.02.24
申请号	KR20040101606	申请日期	2004.12.06
申请人	DONGBUANAM SEMICONDUCTOR INC.	发明人	KIM, HYOUNG YOON
分类号	H01L21/28	主分类号	H01L21/28
代理机构		代理人
主权项
地址

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