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发明名称
METHOD FOR POST TREATMENT OF METAL WIRING OF SEMICONDUCTOR DEVICE
摘要
申请公布号
KR20060016686(A)
申请公布日期
2006.02.22
申请号
KR20040065209
申请日期
2004.08.18
申请人
DONGBUANAM SEMICONDUCTOR INC.
发明人
LEE, YANG BIRM
分类号
H01L21/3065
主分类号
H01L21/3065
代理机构
代理人
主权项
地址
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