SILICA SOL FOR POLISH, AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide silica sol for polishing a base surface evenly by controlling the scratch and etch pit of the base surface, and also to provide its manufacturing method.

SOLUTION: The silica sol is constituted of silica sol of 5-50% of the weight of solid content concentration wherein the spherical silica particulates processed with silica and alumina disperse to a basin system dispersion medium. It meets following conditions: (a) the mean particle size of spherical silica particulates is 20-110 nm; (b) with respect to the diameter of a particle, the number of big rough particles of 800 nm or more is 3,000/ml or less per 1% of the weight of spherical silica particulate concentration; (c) the range of pH is pH 1-4 or pH 8-11; and (d) the content of inorganic negative ion is 20 ppm or less.

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