发明名称 IMPROVED METHOD OF FORMING BOTTOM-GATE THIN-FILM TRANSISTOR BY USING BLENDED SOLUTION TO FORM SEMICONDUCTOR LAYER AND INSULATING LAYER
摘要 PROBLEM TO BE SOLVED: To form a polymer layer and seal the layer in an electronic device. SOLUTION: In a method of forming a semiconductive polymer layer protected by an insulating polymer layer, materials for forming a semiconductive polymer and an insulating polymer are dissolved in a solvent. When a blended solution is deposited on a substrate, the semiconductive polymer and the insulating polymer are separated. When the solvent is vaporized, a semiconductive material forms an active area of a TFT and the insulating polymer minimizes the exposure of the semiconductive polymer to the air. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006013492(A) 申请公布日期 2006.01.12
申请号 JP20050178743 申请日期 2005.06.20
申请人 PALO ALTO RESEARCH CENTER INC 发明人 ARIAS ANA C
分类号 H01L29/786;H01L21/312;H01L21/336;H01L51/00;H01L51/05 主分类号 H01L29/786
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